Bitte benutzen Sie diese Kennung, um auf die Ressource zu verweisen: http://dx.doi.org/10.18419/opus-8210
Langanzeige der Metadaten
DC ElementWertSprache
dc.contributor.authorHurm, Volkerde
dc.contributor.authorRosenzweig, Josefde
dc.contributor.authorLudwig, Manfredde
dc.contributor.authorBenz, Willide
dc.contributor.authorOsorio, Ricardode
dc.contributor.authorBerroth, Manfredde
dc.contributor.authorHülsmann, Axelde
dc.contributor.authorKaufel, Gudrunde
dc.contributor.authorKöhler, Klausde
dc.contributor.authorRaynor, Briande
dc.contributor.authorSchneider, Joachimde
dc.date.accessioned2014-05-12de
dc.date.accessioned2016-03-31T11:45:30Z-
dc.date.available2014-05-12de
dc.date.available2016-03-31T11:45:30Z-
dc.date.issued1991de
dc.identifier.other406381046de
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-92722de
dc.identifier.urihttp://elib.uni-stuttgart.de/handle/11682/8227-
dc.identifier.urihttp://dx.doi.org/10.18419/opus-8210-
dc.description.abstractA photoreceiver based on a metal-semiconductor-metal (MSM) photodiode and AlGaAs/GaAs HEMTs is presented. The photoreceiver was fabricated using a 0.5-μm recessed-gate process for double delta-doped quantum-well HEMTs. The following mean values for the enhancement and depletion HEMT parameters, respectively, have been obtained: threshold voltages of 0.1 and -0.5 V, transconductances of 500 and 390 mS/mm, source resistances of 0.7 and 0.6 Ω-mm, and transit frequencies of 35 and 30 GHz. This process includes photodiodes. A deep wet etch was used to deposit the photodiodes on an undoped GaAs buffer layer.en
dc.language.isoende
dc.rightsinfo:eu-repo/semantics/openAccessde
dc.subject.classificationPhotodiode , Galliumarsenid , Aluminiumarsenid , Mischkristall , HEMTde
dc.subject.ddc621.3de
dc.title10 Gb/s monolithic integrated MSM-photodiode AlGaAs/GaAs-HEMT optoelectronic receiveren
dc.typearticlede
ubs.fakultaetFakultätsübergreifend / Sonstige Einrichtungde
ubs.institutSonstige Einrichtungde
ubs.opusid9272de
ubs.publikation.sourceIEEE transactions on electron devices 38 (1991), S. 2713. URL http://dx.doi.org./ 10.1109/16.158744de
ubs.publikation.typZeitschriftenartikelde
Enthalten in den Sammlungen:15 Fakultätsübergreifend / Sonstige Einrichtung

Dateien zu dieser Ressource:
Datei Beschreibung GrößeFormat 
ber28.pdf138,08 kBAdobe PDFÖffnen/Anzeigen


Alle Ressourcen in diesem Repositorium sind urheberrechtlich geschützt.