05 Fakultät Informatik, Elektrotechnik und Informationstechnik
Permanent URI for this collectionhttps://elib.uni-stuttgart.de/handle/11682/6
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Item Open Access Unified model for laser doping of silicon from precursors(2021) Hassan, Mohamed; Dahlinger, Morris; Köhler, Jürgen R.; Zapf-Gottwick, Renate; Werner, Jürgen H.Laser doping of silicon with the help of precursors is well established in photovoltaics. Upon illumination with the constant or pulsed laser beam, the silicon melts and doping atoms from the doping precursor diffuse into the melted silicon. With the proper laser parameters, after resolidification, the silicon is doped without any lattice defects. Depending on laser energy and on the kind of precursor, the precursor either melts or evaporates during the laser process. For high enough laser energies, even parts of the silicon’s surface evaporate. Here, we present a unified model and simulation program, which considers all these cases. We exemplify our model with experiments and simulations of laser doping from a boron oxide precursor layer. In contrast to previous models, we are able to predict not only the width and depth of the patterns on the deformed silicon surface but also the doping profiles over a wide range of laser energies. In addition, we also show that the diffusion of the boron atoms in the molten Si is boosted by a thermally induced convection in the silicon melt: the Gaussian intensity distribution of the laser beam increases the temperature-gradient-induced surface tension gradient, causing the molten Si to circulate by Marangoni convection. Laser pulse energy densities above H > 2.8 J/cm2 lead not only to evaporation of the precursor, but also to a partial evaporation of the molten silicon. Without considering the evaporation of Si, it is not possible to correctly predict the doping profiles for high laser energies. About 50% of the evaporated materials recondense and resolidify on the wafer surface. The recondensed material from each laser pulse forms a dopant source for the subsequent laser pulses.Item Open Access Laser activation for highly boron-doped passivated contacts(2023) Sharbaf Kalaghichi, Saman; Hoß, Jan; Zapf-Gottwick, Renate; Werner, Jürgen H.Passivated, selective contacts in silicon solar cells consist of a double layer of highly doped polycrystalline silicon (poly Si) and thin interfacial silicon dioxide (SiO2). This design concept allows for the highest efficiencies. Here, we report on a selective laser activation process, resulting in highly doped p++-type poly Si on top of the SiO2. In this double-layer structure, the p++-poly Si layer serves as a layer for transporting the generated holes from the bulk to a metal contact and, therefore, needs to be highly conductive for holes. High boron-doping of the poly Si layers is one approach to establish the desired high conductivity. In a laser activation step, a laser pulse melts the poly Si layer, and subsequent rapid cooling of the Si melt enables electrically active boron concentrations exceeding the solid solubility limit. In addition to the high conductivity, the high active boron concentration in the poly Si layer allows maskless patterning of p++-poly Si/SiO2 layers by providing an etch stop layer in the Si etchant solution, which results in a locally structured p++-poly Si/SiO2 after the etching process. The challenge in the laser activation technique is not to destroy the thin SiO2, which necessitates fine tuning of the laser process. In order to find the optimal processing window, we test laser pulse energy densities (Hp) in a broad range of 0.7 J/cm2 ≤ Hp ≤ 5 J/cm2 on poly Si layers with two different thicknesses dpoly Si,1 = 155 nm and dpoly Si,2 = 264 nm. Finally, the processing window 2.8 J/cm2≤ Hp ≤ 4 J/cm2 leads to the highest sheet conductance (Gsh) without destroying the SiO2 for both poly Si layer thicknesses. For both tested poly Si layers, the majority of the symmetric lifetime samples processed using these Hp achieve a good passivation quality with a high implied open circuit voltage (iVOC) and a low saturation current density (J0). The best sample achieves iVOC = 722 mV and J0 = 6.7 fA/cm2 per side. This low surface recombination current density, together with the accompanying measurements of the doping profiles, suggests that the SiO2 is not damaged during the laser process. We also observe that the passivation quality is independent of the tested poly Si layer thicknesses. The findings of this study show that laser-activated p++-poly Si/SiO2 are not only suitable for integration into advanced passivated contact solar cells, but also offer the possibility of maskless patterning of these stacks, substantially simplifying such solar cell production.Item Open Access Solar cells with laser doped boron layers from atmospheric pressure chemical vapor deposition(2022) Zapf-Gottwick, Renate; Seren, Sven; Fernandez-Robledo, Susana; Wete, Evariste-Pasky; Schiliro, Matteo; Hassan, Mohamed; Mihailetchi, Valentin; Buck, Thomas; Kopecek, Radovan; Köhler, Jürgen; Werner, Jürgen H.We present laser-doped interdigitated back contact (IBC) solar cells with efficiencies of 23% on an area of 244 cm2 metallized by a screen-printed silver paste. Local laser doping is especially suited for processing IBC cells where a multitude of pn-junctions and base contacts lay side by side. The one-sided deposition of boron-doped precursor layers by atmospheric pressure chemical vapor deposition (APCVD) is a cost-effective method for the production of IBC cells without masking processes. The properties of the laser-doped silicon strongly depend on the precursor’s purity, thickness, and the total amount of boron dopants. Variations of the precursor in terms of thickness and boron content, and of the laser pulse energy density, can help to tailor the doping and sheet resistance. With saturation-current densities of 70 fA/cm2 at sheet resistances of 60 Ohm/sq, we reached maximum efficiencies of 23% with a relatively simple, industrial process for bifacial IBC-cells, with 70% bifaciality measured on the module level. The APCVD-layers were deposited with an inline lab-type system and a metal transport belt and, therefore, may have been slightly contaminated, limiting the efficiencies when compared to thermal-diffused boron doping. The use of an industrial APCVD system with a quartz glass transport system would achieve even higher efficiencies.