(1986) Burger, Wilfried; Lassmann, Kurt; Holm, Claus; Wagner, Peter
At low temperatures shallow neutral donors and acceptors in silicon can bind an extra carrier to form the so-called D- and A+ centers. With the method of phonon-induced electrical conductivity (PIC) we find the same threshold energies for the detachment of these carriers associated with the shallow impurities P and B, as have been obtained previously by FIR measurements. This shows that the detachment is by a one-phonon process. We find that there is no central cell correction for the binding to the deeper acceptors Al and Ga, whereas for In+ the binding energy is as large as 5,8 meV. We interprete this dependence on acceptor species as another example of the shallow-deep instability of the binding energy with the variation of the central cell potential.
The bath of thermal phonons is a well-known source of impedance to electronic conduction in solids. Turning the tables, a change in electronic conductance may be used for phonon detection, as will be discussed in the following.
