Marx, DieterEisenmenger, Wolfgang2010-08-092016-03-312010-08-092016-03-311983340316268http://nbn-resolving.de/urn:nbn:de:bsz:93-opus-55826http://elib.uni-stuttgart.de/handle/11682/4985http://dx.doi.org/10.18419/opus-4968Comparing measurements of high-frequency phonon reflection at the uncovered and optically polished (100)-silicon surface, with calculations considering phonon focusing, reveal complete diffusive scattering with at most 4% specular reflection contribution. Two possible mechanisms causing diffusive scattering are discussed.eninfo:eu-repo/semantics/openAccessPhononenemission , Silicium530article2011-05-17