Goer, Anne M. deLocatelli, MarcelLassmann, Kurt2009-10-072016-03-312009-10-072016-03-31198131796478Xhttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-46923http://elib.uni-stuttgart.de/handle/11682/4905http://dx.doi.org/10.18419/opus-4888Thermal conductivity measurements of silicon crystals doped with Bor In have shown the presence of several phonon scattering processes. The resonant effect observed below 1 K is ascribed to the existence of a distribution of splittings N(&#948;) of the &#915;8 ground state of the acceptor, which could be related to the presence of oxygen and carbon impurities. In two cases, the maximum of N(&#948;) occurs for &#948; max near 6 GHz, in agreement with previous ultrasonic studies.eninfo:eu-repo/semantics/openAccessAkzeptor <Halbleiterphysik> , Phononenemission , Silicium530A study of the ground state of acceptors in silicon from thermal transport experimentsarticle2014-09-11