Fabrication and characterization of a thermal flow sensor based on the Ensinger microsystems technology

dc.contributor.authorWalter, Daniela
dc.contributor.authorBülau, André
dc.contributor.authorBengsch, Sebastian
dc.contributor.authorGläser, Kerstin
dc.contributor.authorZimmermann, André
dc.date.accessioned2025-07-11T11:33:12Z
dc.date.issued2025
dc.description.abstractThermal mass flow sensors (TMFS) are used to detect the flow rates of gases. TMFS elements are available in different technologies and, depending on the one used, the material choice of substrate, heater, and temperature sensors can limit their performance. In this work, a sensor element based on the Ensinger Microsystems Technology (EMST) is presented that uses PEEK as the substrate, nickel-chromium as the heater, and nickel as the temperature sensor material. The fabrication process of the element is described, the completion to a flow sensor with a control and readout circuit based on discharge time measurement with picosecond resolution is presented, and measurement results are shown, which are compared to sensors with a commercially available element based on thin film technology on ceramic and an element built with discrete components, all using the same electronics. It is shown that the operation of all sensor elements with the proposed readout circuit was successful, flow-dependent signals were achieved, and the performance of TMFS in EMST improved. Its heater shows better results compared to the commercial element due to material choice with a smaller temperature coefficient of resistance. In its current state, the TMFS in EMST is suitable to detect flow rates > 20 SLPM. The performance needs to be improved further, since the temperature sensors still differ too much from another.en
dc.identifier.issn2673-8244
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-ds-167670de
dc.identifier.urihttps://elib.uni-stuttgart.de/handle/11682/16767
dc.identifier.urihttps://doi.org/10.18419/opus-16748
dc.language.isoen
dc.relation.uridoi:10.3390/metrology5030041
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightsCC-BY
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subject.ddc620
dc.titleFabrication and characterization of a thermal flow sensor based on the Ensinger microsystems technologyen
dc.typearticle
dc.type.versionpublishedVersion
ubs.fakultaetKonstruktions-, Produktions- und Fahrzeugtechnik
ubs.fakultaetExterne wissenschaftliche Einrichtungen
ubs.fakultaetFakultätsübergreifend / Sonstige Einrichtung
ubs.institutInstitut für Mikrointegration
ubs.institutHahn-Schickard
ubs.institutFakultätsübergreifend / Sonstige Einrichtung
ubs.publikation.noppnyesde
ubs.publikation.seiten22
ubs.publikation.sourceMetrology 5 (2025), No. 41
ubs.publikation.typZeitschriftenartikel
ubs.unilizenzOK

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