Influence of pulse duration on X-ray emission during industrial ultrafast laser processing

dc.contributor.authorHolland, Julian
dc.contributor.authorWeber, Rudolf
dc.contributor.authorSailer, Marc
dc.contributor.authorGraf, Thomas
dc.date.accessioned2022-11-09T12:41:18Z
dc.date.available2022-11-09T12:41:18Z
dc.date.issued2022
dc.date.updated2022-04-08T13:36:56Z
dc.description.abstractSoft X-ray emissions during the processing of industrial materials with ultrafast lasers are of major interest, especially against the background of legal regulations. Potentially hazardous soft X-rays, with photon energies of >5 keV, originate from the fraction of hot electrons in plasma, the temperature of which depends on laser irradiance. The interaction of a laser with the plasma intensifies with growing plasma expansion during the laser pulse, and the fraction of hot electrons is therefore enhanced with increasing pulse duration. Hence, pulse duration is one of the dominant laser parameters that determines the soft X-ray emission. An existing analytical model, in which the fraction of hot electrons was treated as a constant, was therefore extended to include the influence of the duration of laser pulses on the fraction of hot electrons in the generated plasma. This extended model was validated with measurements of H (0.07) dose rates as a function of the pulse duration for a constant irradiance of about 3.5 × 1014 W/cm2, a laser wavelength of 800 nm, and a pulse repetition rate of 1 kHz, as well as for varying irradiance at the laser wavelength of 1030 nm and pulse repetition rates of 50 kHz and 200 kHz. The experimental data clearly verified the predictions of the model and confirmed that significantly decreased dose rates are generated with a decreasing pulse duration when the irradiance is kept constant.en
dc.identifier.issn1996-1944
dc.identifier.other1824145926
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-ds-125329de
dc.identifier.urihttp://elib.uni-stuttgart.de/handle/11682/12532
dc.identifier.urihttp://dx.doi.org/10.18419/opus-12513
dc.language.isoende
dc.relation.uridoi:10.3390/ma15062257de
dc.rightsinfo:eu-repo/semantics/openAccessde
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/de
dc.subject.ddc530de
dc.titleInfluence of pulse duration on X-ray emission during industrial ultrafast laser processingen
dc.typearticlede
ubs.fakultaetKonstruktions-, Produktions- und Fahrzeugtechnikde
ubs.fakultaetFakultätsübergreifend / Sonstige Einrichtungde
ubs.institutInstitut für Strahlwerkzeugede
ubs.institutFakultätsübergreifend / Sonstige Einrichtungde
ubs.publikation.seiten8de
ubs.publikation.sourceMaterials 15 (2022), No. 2257de
ubs.publikation.typZeitschriftenartikelde

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