Universität Stuttgart
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Item Open Access Mass-producible micro-optical elements by injection compression molding and focused ion beam structured titanium molding tools(2020) Ristok, Simon; Roeder, Marcel; Thiele, Simon; Hentschel, Mario; Guenther, Thomas; Zimmermann, André; Herkommer, Alois; Giessen, HaraldItem Open Access Use of PtC nanotips for low-voltage quantum tunneling applications(2022) Haub, Michael; Guenther, Thomas; Bogner, Martin; Zimmermann, AndréThe use of focused ion and focused electron beam (FIB/FEB) technology permits the fabrication of micro- and nanometer scale geometries. Therefore, FIB/FEB technology is a favorable technique for preparing TEM lamellae, nanocontacts, or nanowires and repairing electronic circuits. This work investigates FIB/FEB technology as a tool for nanotip fabrication and quantum mechanical tunneling applications at a low tunneling voltage. Using a gas injection system (GIS), the Ga-FIB and FEB technology allows both additive and subtractive fabrication of arbitrary structures. Using energy dispersive X-ray spectroscopy (EDX), resistance measurement (RM), and scanning tunneling microscope (STM)/spectroscopy (STS) methods, the tunneling suitability of the utilized metal–organic material–platinum carbon (PtC) is investigated. Thus, to create electrode tips with radii down to 15 nm, a stable and reproducible process has to be developed. The metal–organic microstructure analysis shows suitable FIB parameters for the tunneling effect at high aperture currents (260 pA, 30 kV). These are required to ensure the suitability of the electrodes for the tunneling effect by an increased platinum content (EDX), a low resistivity (RM), and a small band gap (STM). The STM application allows the imaging of highly oriented pyrolytic graphite (HOPG) layers and demonstrates the tunneling suitability of PtC electrodes based on high FIB aperture currents and a low tunneling voltage.Item Open Access Reliability study and thermal performance of LEDs on molded interconnect devices (MID) and PCB(2018) Soltani, Mahdi; Freyburger, Moritz; Kulkarni, Romit; Mohr, Rainer; Groezinger, Tobias; Zimmermann, AndréItem Open Access Analysis of tempering effects on LDS-MID and PCB substrates for HF applications(2023) Wolf, Marius; Werum, Kai; Guenther, Thomas; Schleeh, Lisa; Eberhardt, Wolfgang; Zimmermann, AndréMechatronic Integrated Devices or Molded Interconnect Devices (MID) are three-dimensional (3D) circuit carriers. They are mainly fabricated by laser direct structuring (LDS) and subsequent electroless copper plating of an injection molded 3D substrate. Such LDS-MID are used in many applications today, especially antennas. However, in high frequency (HF) systems in 5G and radar applications, the demand on 3D circuit carriers and antennas increases. Electroless copper, widely used in MID, has significantly lower electrical conductivity compared to pure copper. Its lower conductivity increases electrical loss, especially at higher frequencies, where signal budget is critical. Heat treatment of electroless copper deposits can improve their conductivity and adhesion to the 3D substrates. This paper investigates the effects induced by tempering processes on the metallization of LDS-MID substrates. As a reference, HF Printed Circuit Boards (PCB) substrates are also considered. Adhesion strength and conductivity measurements, as well as permittivity and loss angle measurements up to 1 GHz, were carried out before and after tempering processes. The main influencing factors on the tempering results were found to be tempering temperature, atmosphere, and time. Process parameters like the heating rate or applied surface finishes had only a minor impact on the results. It was found that tempering LDS-MID substrates can improve the copper adhesion and lower their electrical resistance significantly, especially for plastics with a high melting temperature. Both improvements could improve the reliability of LDS-MID, especially in high frequency applications. Firstly, because increased copper adhesion can prevent delamination and, secondly, because the lowered electrical resistance indicates, in accordance with the available literature, a more ductile copper metallization and thus a lower risk of microcracks.Item Open Access A 10 V transfer standard based on low-noise solid-state Zener voltage reference ADR1000(2024) Bülau, André; Walter, Daniela; Zimmermann, AndréVoltage standards are widely used to transfer volts from Josephson voltage standards (JVSs) at national metrology institutes (NMIs) into calibration labs to maintain the volts and to transfer them to test equipment at production lines. Therefore, commercial voltage standards based on Zener diodes are used. Analog Devices Inc. (San Jose, CA, USA), namely, Eric Modica, introduced the ADR1000KHZ, a successor to the legendary LTZ1000, at the Metrology Meeting 2021. The first production samples were already available prior to this event. In this article, this new temperature-stabilized Zener diode is compared to several others as per datasheet specifications. Motivated by the superior parameters, a 10 V transfer standard prototype for laboratory use with commercial off-the-shelf components such as resistor networks and chopper amplifiers was built. How much effort it takes to reach the given parameters was investigated. This paper describes how the reference was set up to operate it at its zero-temperature coefficient (z.t.c.) temperature and to lower the requirements for the oven stability. Furthermore, it is shown how the overall temperature coefficient (t.c.) of the circuit was reduced. For the buffered Zener voltage, a t.c. of almost zero, and with amplification to 10 V, a t.c. of <0.01 µV/V/K was achieved in a temperature span of 15 to 31 °C. For the buffered Zener voltage, a noise of ~584 nVp-p and for the 10 V output, ~805 nVp-p were obtained. Finally, 850 days of drift data were taken by comparing the transfer standard prototype to two Fluke 7000 voltage standards according to the method described in NBS Technical Note 430. The drift specification was, however, not met.Item Open Access Injection compression molded microlens arrays for hyperspectral imaging(2018) Röder, Marcel; Drexler, Marc; Rothermel, Thilo; Meissner, Thomas; Guenther, Thomas; Zimmermann, AndréItem Open Access Direct processing of PVD hard coatings via focused ion beam milling for microinjection molding(2023) Ruehl, Holger; Guenther, Thomas; Zimmermann, AndréHard coatings can be applied onto microstructured molds to influence wear, form filling and demolding behaviors in microinjection molding. As an alternative to this conventional manufacturing procedure, “direct processing” of physical-vapor-deposited (PVD) hard coatings was investigated in this study, by fabricating submicron features directly into the coatings for a subsequent replication via molding. Different diamondlike carbon (DLC) and chromium nitride (CrN) PVD coatings were investigated regarding their suitability for focused ion beam (FIB) milling and microinjection molding using microscope imaging and areal roughness measurements. Each coating type was deposited onto high-gloss polished mold inserts. A specific test pattern containing different submicron features was then FIB-milled into the coatings using varied FIB parameters. The milling results were found to be influenced by the coating morphology and grain microstructure. Using injection–compression molding, the submicron structures were molded onto polycarbonate (PC) and cyclic olefin polymer (COP). The molding results revealed contrasting molding performances for the studied coatings and polymers. For CrN and PC, a sufficient replication fidelity based on AFM measurements was achieved. In contrast, only an insufficient molding result could be obtained for the DLC. No abrasive wear or coating delamination could be found after molding.Item Open Access Open-eco-innovation for SMEs with pan-European key enabling technology centres(2020) Civelek, Faruk; Kulkarni, Romit; Fritz, Karl-Peter; Meyer, Tanja; Troulos, Costas; Guenther, Thomas; Zimmermann, AndréThe project “key enabling technologies for clean production” (KET4CP), which is supported by the European Commission, has the aim to connect small and medium-sized enterprises (SME) and Technology Centres (TC) for cleaner, greener and more efficient production. Within this context, SMEs and TCs across Europe work together to establish an open-innovation network and to raise awareness in productivity and environmental performance. This article presents how an open European network of TCs opens its innovation process to support SMEs to become cleaner, greener and more efficient. Furthermore, this article shows how the TCs and SMEs become a part of the open-eco-innovation platform in clean production and how successful the open-eco-innovation process of different European countries is. We revealed that a pan-European open innovation process for eco-innovations with TCs for key enabling technologies (KET TCs) and Enterprise Europe Network partners (EEN) is a successful approach for SMEs that want to produce and develop cleaner products. An application example is mentioned, in which TCs from different European countries have contributed to developing a product of a SME for energy harvesting. The SME, together with the TCs, developed a generator that is installed in city-level water supply pipes and so, it is outstanding in its application. This innovative application is also described in this article.Item Open Access Development and validation of a novel setup for LEDs lifetime estimation on molded interconnect devices(2018) Soltani, Mahdi; Freyburger, Moritz; Kulkarni, Romit; Mohr, Rainer; Groezinger, Tobias; Zimmermann, AndréItem Open Access Review on excess noise measurements of resistors(2023) Walter, Daniela; Bülau, André; Zimmermann, AndréIncreasing demands for precision electronics require individual components such as resistors to be specified, as they can be the limiting factor within a circuit. To specify quality and long-term stability of resistors, noise measurements are a common method. This review briefly explains the theoretical background, introduces the noise index and provides an insight on how this index can be compared to other existing parameters. It then focuses on the different methods to measure excess noise in resistors. The respective advantages and disadvantages are pointed out in order to simplify the decision of which setup is suitable for a particular application. Each method is analyzed based on the integration of the device under test, components used, shielding considerations and signal processing. Furthermore, our results on the excess noise of resistors and resistor networks are presented using two different setups, one for very low noise measurements down to 20 µHz and one for broadband up to 100 kHz. The obtained data from these measurements are then compared to published data. Finally, first measurements on commercial strain gauges and inkjet-printed strain gauges are presented that show an additional 1/fα component compared to commercial resistors and resistor networks.