Please use this identifier to cite or link to this item: http://dx.doi.org/10.18419/opus-7348
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dc.contributor.authorSchilling, Dorisde
dc.contributor.authorDransfeld, Klausde
dc.contributor.authorBihler, Eckardtde
dc.contributor.authorHoldik, Karlde
dc.contributor.authorEisenmenger, Wolfgangde
dc.date.accessioned2010-08-09de
dc.date.accessioned2016-03-31T11:42:50Z-
dc.date.available2010-08-09de
dc.date.available2016-03-31T11:42:50Z-
dc.date.issued1989de
dc.identifier.other347749119de
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-56043de
dc.identifier.urihttp://elib.uni-stuttgart.de/handle/11682/7365-
dc.identifier.urihttp://dx.doi.org/10.18419/opus-7348-
dc.description.abstractThe depth profiles of the polarization in films of polyvinylidene fluoride (PVDF) as well as in vinylidene‐fluoride–trifluoroethylene (VDF‐TrFE) copolymer films polarized by a focused electron beam were investigated using the piezoelectrically generated pressure step method. The dominant polarization exhibits a broad maximum inside the film. The position of this maximum depends not only on the energy of the incident electrons but also on the material parameters of the sample. Close to the surface exposed to the electron beam we have in addition observed a small secondary maximum of opposite polarization (amounting to about 1 mC/m2). A qualitative model is presented for the poling of films of PVDF and its copolymers with TrFE by focused electron beam accounting for most of the observed features. The application of electron beams for the poling of ferroelectric films allows the production of piezoelectric bimorphs. By using a well‐focused electron beam also ferroelectric domains of very small lateral dimensions can be created which could become important for ferroelectric data storage.en
dc.language.isoende
dc.rightsinfo:eu-repo/semantics/openAccessde
dc.subject.classificationPolyvinylidenfluorid , Dielektrische Polarisationde
dc.subject.ddc530de
dc.titlePolarization profiles of polyvinylidene fluoride films polarized by a focused electron beamen
dc.typearticlede
ubs.fakultaetFakultätsübergreifend / Sonstige Einrichtungde
ubs.fakultaetFakultät Mathematik und Physikde
ubs.institutSonstige Einrichtungde
ubs.institut1. Physikalisches Institutde
ubs.opusid5604de
ubs.publikation.sourceJournal of applied physics 65 (1989), S. 269-275. URL http://dx.doi.org./10.1063/1.342536de
ubs.publikation.typZeitschriftenartikelde
Appears in Collections:15 Fakultätsübergreifend / Sonstige Einrichtung

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