3D direct laser writing of highly absorptive photoresist for miniature optical apertures

dc.contributor.authorSchmid, Michael D.
dc.contributor.authorToulouse, Andrea
dc.contributor.authorThiele, Simon
dc.contributor.authorMangold, Simon
dc.contributor.authorHerkommer, Alois
dc.contributor.authorGiessen, Harald
dc.date.accessioned2023-11-08T13:41:41Z
dc.date.available2023-11-08T13:41:41Z
dc.date.issued2022de
dc.date.updated2023-10-10T20:31:49Z
dc.description.abstractThe importance of 3D direct laser writing as an enabling technology increased rapidly in recent years. Complex micro-optics and optical devices with various functionalities are now feasible. Different possibilities to increase the optical performance are demonstrated, for example, multi-lens objectives, a combination of different photoresists, or diffractive optical elements. It is still challenging to create fitting apertures for these micro optics. In this work, a novel and simple way to create 3D-printed opaque structures with a highly absorptive photoresist is introduced, which can be used to fabricate microscopic apertures increasing the contrast of 3D-printed micro optics and enabling new optical designs. Both hybrid printing by combining clear and opaque resists, as well as printing transparent optical elements and their surrounding opaque apertures solely from a single black resist by using different printing thicknesses are demonstrated.en
dc.description.sponsorshipDFGde
dc.description.sponsorshipBMBFde
dc.description.sponsorshipERCde
dc.description.sponsorshipMinisterium für Wissenschaft, Forschung und Kunst Baden-Württembergde
dc.description.sponsorshipVector-Stiftungde
dc.description.sponsorshipProjekt DEALde
dc.identifier.issn1616-301X
dc.identifier.issn1616-3028
dc.identifier.other1871000955
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-ds-137441de
dc.identifier.urihttp://elib.uni-stuttgart.de/handle/11682/13744
dc.identifier.urihttp://dx.doi.org/10.18419/opus-13725
dc.language.isoende
dc.relationinfo:eu-repo/grantAgreement/EC/FP7/321331de
dc.relationinfo:eu-repo/grantAgreement/EC/H2020/862549de
dc.relation.uridoi:10.1002/adfm.202211159de
dc.rightsinfo:eu-repo/semantics/openAccessde
dc.rights.urihttps://creativecommons.org/licenses/by-nc/4.0/de
dc.subject.ddc530de
dc.title3D direct laser writing of highly absorptive photoresist for miniature optical aperturesen
dc.typearticlede
ubs.fakultaetKonstruktions-, Produktions- und Fahrzeugtechnikde
ubs.fakultaetMathematik und Physikde
ubs.fakultaetFakultäts- und hochschulübergreifende Einrichtungende
ubs.fakultaetFakultätsübergreifend / Sonstige Einrichtungde
ubs.institutInstitut für Technische Optikde
ubs.institut4. Physikalisches Institutde
ubs.institutStuttgart Research Centre of Photonic Engineering (SCoPE)de
ubs.institutFakultätsübergreifend / Sonstige Einrichtungde
ubs.publikation.seiten8de
ubs.publikation.sourceAdvanced functional materials 33 (2023), No. 2211159de
ubs.publikation.typZeitschriftenartikelde

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