High frequency phonon transmission through amorphous films

dc.contributor.authorMebert, Joachimde
dc.contributor.authorMaile, Berndde
dc.contributor.authorEisenmenger, Wolfgangde
dc.date.accessioned2011-01-24de
dc.date.accessioned2016-03-31T08:36:16Z
dc.date.available2011-01-24de
dc.date.available2016-03-31T08:36:16Z
dc.date.issued1990de
dc.date.updated2011-11-29de
dc.description.abstractWe now report on phonon spectroscopy measurements in the frequency range from 300 GHz - 1 THz on thin amorphous films of several materials (i.e. e-beam evaporated SiO2., α-Si and α-Ge). Some films were prepared in a residual gas atmosphere as H20 and N2.en
dc.identifier.other353834580de
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-59288de
dc.identifier.urihttp://elib.uni-stuttgart.de/handle/11682/5026
dc.identifier.urihttp://dx.doi.org/10.18419/opus-5009
dc.language.isoende
dc.rightsinfo:eu-repo/semantics/openAccessde
dc.subject.classificationPhononenemission , Phononenspektroskopiede
dc.subject.ddc530de
dc.titleHigh frequency phonon transmission through amorphous filmsen
dc.typeconferenceObjectde
ubs.fakultaetFakultät Mathematik und Physikde
ubs.institut1. Physikalisches Institutde
ubs.opusid5928de
ubs.publikation.sourceHunklinger, Siegfried (Hrsg.): Phonons 89 : Heidelberg, 21-25 August 1989, Federal Republic Germany; proceedings of the Third International Conference on Phonon Physics and the Sixth International Conference on Phonon Scattering in Condensed Matter. Singapur : World Scientific, 1990, S. 495-497de
ubs.publikation.typKonferenzbeitragde

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