Diffusive scattering of high-frequency phonons at free silicon surfaces

dc.contributor.author	Marx, Dieter	de
dc.contributor.author	Eisenmenger, Wolfgang	de
dc.date.accessioned	2010-08-09	de
dc.date.accessioned	2016-03-31T08:36:09Z
dc.date.available	2010-08-09	de
dc.date.available	2016-03-31T08:36:09Z
dc.date.issued	1983	de
dc.date.updated	2011-05-17	de
dc.description.abstract	Comparing measurements of high-frequency phonon reflection at the uncovered and optically polished (100)-silicon surface, with calculations considering phonon focusing, reveal complete diffusive scattering with at most 4% specular reflection contribution. Two possible mechanisms causing diffusive scattering are discussed.	en
dc.identifier.other	340316268	de
dc.identifier.uri	http://nbn-resolving.de/urn:nbn:de:bsz:93-opus-55826	de
dc.identifier.uri	http://elib.uni-stuttgart.de/handle/11682/4985
dc.identifier.uri	http://dx.doi.org/10.18419/opus-4968
dc.language.iso	en	de
dc.rights	info:eu-repo/semantics/openAccess	de
dc.subject.classification	Phononenemission , Silicium	de
dc.subject.ddc	530	de
dc.title	Diffusive scattering of high-frequency phonons at free silicon surfaces	en
dc.type	article	de
ubs.fakultaet	Fakultät Mathematik und Physik	de
ubs.institut	1. Physikalisches Institut	de
ubs.opusid	5582	de
ubs.publikation.source	Physics Letters, A 93 (1983), S. 152-154. URL http://dx.doi.org./10.1016/0375-9601(83)90080-4	de
ubs.publikation.typ	Zeitschriftenartikel	de

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