Ellipsometric investigations of plasmonic nanostructures and thin films

dc.contributor.advisorDressel, Martin (Prof. Dr.)
dc.contributor.authorVoloshenko, Ievgen
dc.date.accessioned2019-12-18T10:47:12Z
dc.date.available2019-12-18T10:47:12Z
dc.date.issued2019de
dc.description.abstractIn this work, plasmonic effects are utilized to answer both technical and fundamental questions regarding the properties of the composite materials. As a main spectroscopic method, Mueller matrix spectroscopic ellipsometry is used. The technique allows one to obtain a complete polarimetric response of the medium, reduced to 16 Mueller matrix elements. This, together with access to a wide range of incident angles, offers a rich set of parameters for the exact recovery of the optical properties of the medium. The studies have been conducted on two types of samples, artificial plasmonic crystals, produced by lithographic methods and on VO2 thin films supporting insulator-metal transition at elevated temperatures, with localized plasmonic states in the intermediate regime.en
dc.identifier.other1685917925
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:bsz:93-opus-ds-106842de
dc.identifier.urihttp://elib.uni-stuttgart.de/handle/11682/10684
dc.identifier.urihttp://dx.doi.org/10.18419/opus-10667
dc.language.isoende
dc.rightsinfo:eu-repo/semantics/openAccessde
dc.subject.ddc530de
dc.titleEllipsometric investigations of plasmonic nanostructures and thin filmsen
dc.typedoctoralThesisde
ubs.dateAccepted2019-10-11
ubs.fakultaetMathematik und Physikde
ubs.institut1. Physikalisches Institutde
ubs.publikation.seitenxlviii, 210de
ubs.publikation.typDissertationde
ubs.thesis.grantorMathematik und Physikde

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