Pulsed laser porosification of silicon thin films

dc.contributor.author	Sämann, Christian
dc.contributor.author	Köhler, Jürgen R.
dc.contributor.author	Dahlinger, Morris
dc.contributor.author	Schubert, Markus B.
dc.contributor.author	Werner, Jürgen H.
dc.date.accessioned	2016-06-27T09:18:30Z
dc.date.available	2016-06-27T09:18:30Z
dc.date.issued	2016	de
dc.identifier.issn	1996-1944
dc.identifier.other	472212974	de
dc.identifier.uri	http://nbn-resolving.de/urn:nbn:de:bsz:93-opus-ds-88146	de
dc.identifier.uri	http://elib.uni-stuttgart.de/handle/11682/8814
dc.identifier.uri	http://dx.doi.org/10.18419/opus-8797
dc.language.iso	en	de
dc.relation.uri	doi:10.3390/ma9070509	de
dc.rights	info:eu-repo/semantics/openAccess	de
dc.subject.ddc	620	de
dc.title	Pulsed laser porosification of silicon thin films	en
dc.type	article	de
ubs.fakultaet	Informatik, Elektrotechnik und Informationstechnik	de
ubs.fakultaet	Interfakultäre Einrichtungen	de
ubs.institut	Institut für Photovoltaik	de
ubs.institut	Stuttgart Research Centre of Photonic Engineering (SCoPE)	de
ubs.publikation.seiten	12	de
ubs.publikation.source	Materials 9 (2016), No. 509	de
ubs.publikation.typ	Zeitschriftenartikel	de

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