15 Fakultätsübergreifend / Sonstige Einrichtung
Permanent URI for this collectionhttps://elib.uni-stuttgart.de/handle/11682/16
Browse
5 results
Search Results
Item Open Access Influence of defects on the splitting of the acceptor ground state in silicon(1984) Ambrosy, Anton; Lassmann, Kurt; Goer, Anne M. de; Salce, Bernard; Zeile, Heinrich-Item Open Access Resonance and relaxation attenuation by neutral acceptors in a magnetic field(1977) Schad, Hanspeter; Lassmann, Kurt; Zeile, HeinrichFine structure, level splitting, and relaxation times of the acceptor ground state in cubic semiconductors can be deduced from ultrasonic attenuation. By the application of a magnetic field it is possible to vary the coupling strength and the number of acceptors on speaking terms with the ultrasonic wave. Making use of this possibility, we have determined directly effective coupling constants for relaxation attenuation and the temperature dependence of the critical intensity for saturation of the resonant interaction. Results obtained for p-type GaAs and Si are discussed in comparison with analogous results for glasses.Item Open Access Down-conversion of high-frequency acoustic phonons(1987) Galkina, Tatjana I.; Blinov, A. Y.; Bonch-Osmolovskii, M. M.; Koblinger, Otto; Lassmann, Kurt; Eisenmenger, WolfgangMeasurements of phonon transport in amorphous media can give valuable information on the structural properties of these materials and may be of practical interest for its own concerning the question of thermalization in electronic devices. The existence of two-level systems in a-Si:H as one of these technically important materials has been concluded from measurements of dispersion and attenuation of acoustic surface waves.Item Open Access Shallow traps correlated with deep impurities in silicon as obtained by phonon induced conductance(1986) Burger, Wilfried; Lassmann, Kurt; Holm, Claus; Wagner, PeterAt low temperatures shallow neutral donors and acceptors in silicon can bind an extra carrier to form the so-called D- and A+ centers. With the method of phonon-induced electrical conductivity (PIC) we find the same threshold energies for the detachment of these carriers associated with the shallow impurities P and B, as have been obtained previously by FIR measurements. This shows that the detachment is by a one-phonon process. We find that there is no central cell correction for the binding to the deeper acceptors Al and Ga, whereas for In+ the binding energy is as large as 5,8 meV. We interprete this dependence on acceptor species as another example of the shallow-deep instability of the binding energy with the variation of the central cell potential.Item Open Access Phonon spectroscopy of defects correlated with the diffusion of Zn into Si(1994) Staiger, Joachim; Groß, Peter; Lassmann, Kurt; Bracht, Hartmut; Stolwijk, Nicolaas A.We analyse by phonon spectroscopy low lying phonon scattering states from defects that are introduced by the diffusion of Zn into thick Si wafers.